半导体结构不均匀性对电物理测量结果的影响

V. G. Savitsky, A. Vlasov, Alexey V. Nemolovsky, Bogdan S. Sokolovsky
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引用次数: 0

摘要

通过计算机模拟和数值分析表明,在非均匀半导体结构中载流子的重新分布对这些样品的霍尔效应和电导率有重要影响,并且在使用电物理测量来确定半导体层参数时产生不正确的数据。对于基于HgCdTe固体合金的半导体结构,这种效应可能表现为在n型宽隙基底上具有p导电性的窄隙层。这种结构对制造红外光电探测器很有意义。因此,对于它们的表征,差分霍尔和电导率法应该非常谨慎地使用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of semiconductor structure inhomogeneity on electrophysical measurement results
By means of computer modeling and numerical analysis it has been shown that redistribution of charge carriers in non- homogeneous semiconductor structures has significant contribution to the Hall effect and conductivity of these samples and produce incorrect data when electrophysical measurements are used for determining the semiconductor layer parameters. For semiconductor structures on the basis of HgCdTe solid alloys this effect may manifest in the case of narrow gap layer with p-conductivity on the n-type wide gap base. Such structures are of interest for manufacturing IR photodetectors.SO for their characterization the differential Hall and conductivity method should be used with great caution.
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