基于MBE合成材料的大功率分布式放大器

B. Kim, H. Tserng, H. Shih
{"title":"基于MBE合成材料的大功率分布式放大器","authors":"B. Kim, H. Tserng, H. Shih","doi":"10.1109/MCS.1985.1113633","DOIUrl":null,"url":null,"abstract":"The main limitations of the output power of a distributed amplifier are the gate line loss and the gate-to-drain breakdown voltage. A novel circuit concept to reduce the gate loss using series capacitors on the gate feeding lines has been implemented. The device breakdown voltage has been improved by using an MBE grown material with two layers (low doped gate buffer layer and usual active layer). A monolithic GaAs distributed amplifier using 6 x 300 µm FETs has achieved an output power of 800 mW with 4dB gain. The power added efficiency was about 15%.","PeriodicalId":231710,"journal":{"name":"Microwave and Millimeter-Wave Monolithic Circuits","volume":"105 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1985-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"11","resultStr":"{\"title\":\"High Power Distributed Amplifier Using MBE Synthesized Material\",\"authors\":\"B. Kim, H. Tserng, H. Shih\",\"doi\":\"10.1109/MCS.1985.1113633\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The main limitations of the output power of a distributed amplifier are the gate line loss and the gate-to-drain breakdown voltage. A novel circuit concept to reduce the gate loss using series capacitors on the gate feeding lines has been implemented. The device breakdown voltage has been improved by using an MBE grown material with two layers (low doped gate buffer layer and usual active layer). A monolithic GaAs distributed amplifier using 6 x 300 µm FETs has achieved an output power of 800 mW with 4dB gain. The power added efficiency was about 15%.\",\"PeriodicalId\":231710,\"journal\":{\"name\":\"Microwave and Millimeter-Wave Monolithic Circuits\",\"volume\":\"105 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1985-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"11\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Microwave and Millimeter-Wave Monolithic Circuits\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MCS.1985.1113633\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Microwave and Millimeter-Wave Monolithic Circuits","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MCS.1985.1113633","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 11

摘要

分布式放大器输出功率的主要限制是栅极线损耗和栅极漏极击穿电压。提出了一种利用栅极馈线上的串联电容来降低栅极损耗的新电路概念。采用两层MBE生长材料(低掺杂栅极缓冲层和普通有源层),提高了器件的击穿电压。采用6 × 300µm场效应管的单片GaAs分布式放大器实现了800 mW的输出功率和4dB增益。功率增加效率约为15%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High Power Distributed Amplifier Using MBE Synthesized Material
The main limitations of the output power of a distributed amplifier are the gate line loss and the gate-to-drain breakdown voltage. A novel circuit concept to reduce the gate loss using series capacitors on the gate feeding lines has been implemented. The device breakdown voltage has been improved by using an MBE grown material with two layers (low doped gate buffer layer and usual active layer). A monolithic GaAs distributed amplifier using 6 x 300 µm FETs has achieved an output power of 800 mW with 4dB gain. The power added efficiency was about 15%.
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