45纳米CMOS技术中抑制器件可变性的后硅编程体偏置平台

Hiroaki Suzuki, M. Kurimoto, Tadao Yamanaka, H. Takata, H. Makino, H. Shinohara
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引用次数: 0

摘要

提出了后硅编程体偏置平台,以抑制45纳米CMOS技术时代的器件变异性。提出的平台在制造后测试期间测量设备速度。然后标记快速模具,使体偏置电路打开并减少在用户应用中选择和标记的模具的漏电流。由于慢模围绕产品的速度规格不偏体,因此产品运行速度与正常的无偏体产品一样快。虽然快速模具的泄漏功率降低了,但速度规格没有改变。该平台改进了包含速度和泄漏功率两种最坏情况的最坏角规范。该测试芯片采用45纳米技术制造,将待机泄漏功率与速度的最差角落提高了70%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Post-silicon programmed body-biasing platform suppressing device variability in 45 nm CMOS technology
The Post-Silicon Programmed Body-Biasing Platform is proposed to suppress device variability in the 45-nm CMOS technology era. The proposed platform measures device speed during post-fabrication testing. Then the fast die is marked so that the body-bias circuit turns on and reduces leakage current of the die that is selected and marked in a user application. Because the slow die around the speed specifications of a product is not body-biased, the product runs as fast as a normal non-body-biasing product. Although the leakage power of a fast die is reduced, the speed specification does not change. The proposed platform improves the worst corner specification comprising the two worst cases of speed and leakage power. The test chip, fabricated using 45-nm technology, improves the worst corner of stand-by leakage power vs. speed by 70%.
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