{"title":"模拟离子交换过程,以支持在薄玻璃片中制造光学多模渐变折射率波导","authors":"T. Kuhler, E. Griese","doi":"10.1109/SPI.2010.5483566","DOIUrl":null,"url":null,"abstract":"Realizing electrical printed circuit boards with integrated optical interconnects for high bandwidth interconnects requires numerical models and algorithms for analyzing and optimising process parameters. In this paper an approach for the numerical computation of the refractive index profile of waveguides manufactored by ion-exchange processes is presented.","PeriodicalId":293987,"journal":{"name":"2010 IEEE 14th Workshop on Signal Propagation on Interconnects","volume":"15 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-05-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"Modeling the ion-exchange process to support the manufacturing of optical multimode graded-index waveguides in thin glass sheets\",\"authors\":\"T. Kuhler, E. Griese\",\"doi\":\"10.1109/SPI.2010.5483566\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Realizing electrical printed circuit boards with integrated optical interconnects for high bandwidth interconnects requires numerical models and algorithms for analyzing and optimising process parameters. In this paper an approach for the numerical computation of the refractive index profile of waveguides manufactored by ion-exchange processes is presented.\",\"PeriodicalId\":293987,\"journal\":{\"name\":\"2010 IEEE 14th Workshop on Signal Propagation on Interconnects\",\"volume\":\"15 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-05-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 IEEE 14th Workshop on Signal Propagation on Interconnects\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SPI.2010.5483566\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 IEEE 14th Workshop on Signal Propagation on Interconnects","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SPI.2010.5483566","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Modeling the ion-exchange process to support the manufacturing of optical multimode graded-index waveguides in thin glass sheets
Realizing electrical printed circuit boards with integrated optical interconnects for high bandwidth interconnects requires numerical models and algorithms for analyzing and optimising process parameters. In this paper an approach for the numerical computation of the refractive index profile of waveguides manufactored by ion-exchange processes is presented.