“你需要另一个门,伙计”:量子线和包裹门控纳米线中的g因子工程

A. Burke, K. Storm, D. Carrad, G. Nylund, S. Svensson, O. Klochan, A. Hamilton, I. Farrer, D. Ritchie, H. Linke, L. Samuelson, A. Micolich
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引用次数: 0

摘要

静电门控AlGaAs/GaAs量子线和InAs纳米线是研究一维电子物理的两种常用平台。量子线通常使用AlGaAs/GaAs异质结构上的分栅结构来定义。纳米线通常由重掺杂的Si衬底从下面进行门控。在这些经过大量研究的传统设备设计中,控制水平是有限的。纳米制造的进步使得实现更复杂的门控方案成为可能,从而改善了对一维器件的控制。我们将讨论我们最近在具有更先进密度控制的一维电子器件上的工作。我们首先从设计用于自旋电子学应用的顶门控量子线中的g因子的可能性开始[1],然后讨论我们在使用包裹门改善InAs纳米线密度控制方面的工作。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
“You need another gate, mate”: g-factor engineering in quantum wires and wrap-gated nanowires
Electrostatically gated AlGaAs/GaAs quantum wires and InAs nanowires are two common platforms for studying 1D electron physics. Quantum wires are typically defined using a splitgate structure on an AlGaAs/GaAs heterostructure. Nanowires are typically gated from below by a heavily doped Si substrate. The level of control is limited in these heavily-studied, traditional device designs. Advancements in nanofabrication make it possible to implement more sophisticated gating schemes, enabling improved control over 1D devices. We will discuss our recent work on 1D electron devices with more advanced density control. We start firstly with the possibility of engineering the g-factor in top-gated quantum wires for spintronics applications [1], and then discuss our work on using wrap-gates to improve density control in InAs nanowires.
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