W. Fichtner, N. Braga, M. Ciappa, V. Mickevičius, M. Schenkel
{"title":"电力器件、电路和系统CAD技术进展","authors":"W. Fichtner, N. Braga, M. Ciappa, V. Mickevičius, M. Schenkel","doi":"10.1109/ISPSD.2005.1487939","DOIUrl":null,"url":null,"abstract":"Over the past decade, the utilization of technology CAD (TCAD) tools has become widespread in industry and academia. The enormous progress in computing hardware and software technology, together with significant advances in physical modelling accuracy, and speed and robustness of numerical algorithms, have made TCAD to a cost-effective albeit powerful technology that complements experimental approaches to wafer processing and metrology.","PeriodicalId":154808,"journal":{"name":"Proceedings. ISPSD '05. The 17th International Symposium on Power Semiconductor Devices and ICs, 2005.","volume":"57 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Progress in Technology CAD for Power Devices, Circuits and Systems\",\"authors\":\"W. Fichtner, N. Braga, M. Ciappa, V. Mickevičius, M. Schenkel\",\"doi\":\"10.1109/ISPSD.2005.1487939\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Over the past decade, the utilization of technology CAD (TCAD) tools has become widespread in industry and academia. The enormous progress in computing hardware and software technology, together with significant advances in physical modelling accuracy, and speed and robustness of numerical algorithms, have made TCAD to a cost-effective albeit powerful technology that complements experimental approaches to wafer processing and metrology.\",\"PeriodicalId\":154808,\"journal\":{\"name\":\"Proceedings. ISPSD '05. The 17th International Symposium on Power Semiconductor Devices and ICs, 2005.\",\"volume\":\"57 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-05-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings. ISPSD '05. The 17th International Symposium on Power Semiconductor Devices and ICs, 2005.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISPSD.2005.1487939\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings. ISPSD '05. The 17th International Symposium on Power Semiconductor Devices and ICs, 2005.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2005.1487939","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Progress in Technology CAD for Power Devices, Circuits and Systems
Over the past decade, the utilization of technology CAD (TCAD) tools has become widespread in industry and academia. The enormous progress in computing hardware and software technology, together with significant advances in physical modelling accuracy, and speed and robustness of numerical algorithms, have made TCAD to a cost-effective albeit powerful technology that complements experimental approaches to wafer processing and metrology.