内禀噪声是纳米级CMOS亚阈值数字逻辑的限制因素吗?

Francisco Veirano, F. Silveira, Lirida Navinery
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引用次数: 1

摘要

固有噪声已经被预测为CMOS缩放的限制。如果是这样的话,在低电源电压下,比如在亚阈值数字电路中应用的电压,这种影响会更严重。本文首次分析了本征噪声对亚阈值数字纳米级CMOS的影响。关键问题,如可变性和实际带宽的研究电路被考虑在内。由于使用简化的MOS晶体管模型,以往的工作大多高估了固有噪声的影响。为了正确计算逆变器输出节点的噪声均方根电压,采用了BSIM4晶体管模型和PTM模型文件,这在亚阈值区域是前所未有的。通过模拟从130纳米到16纳米的技术节点,并考虑到32纳米的可变性,探讨了技术缩放影响。仿真结果表明,可变性极大地提高了亚阈值数字纳米级CMOS的最小工作电压,从而使固有噪声不再是问题,至少降低到32 nm,因为换相电压保持足够高,可以实现可忽略不计的故障率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Is intrinsic noise a limiting factor for subthreshold digital logic in nanoscale CMOS?
Intrinsic noise has been predicted as a limit to CMOS scaling. If this is the case, the effect would be more severe at low supply voltages, such as the ones applied in subthreshold digital circuits. In this work the effect of intrinsic noise in subthreshold digital nanoscale CMOS is analysed for the first time. Key issues such as variability and the actual bandwidth of the studied circuits are taken into account. Most of previous works overestimate the impact of intrinsic noise due to the use of simplified models of the MOS transistor. BSIM4 transistor model and PTM model files are used in order to correctly calculate noise RMS voltage at the output node of an inverter, which has not been done before in the subthreshold region. Technology scaling impact is explored by simulating technology nodes from 130 nm down to 16 nm and considering variability down to 32 nm. Simulation results show that variability strongly increases the minimum operating voltage of subthreshold digital nanoscale CMOS and thus making intrinsic noise not a problem, at least down to 32 nm, since commutation voltage maintains high enough to achieve negligible failure rates.
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