M. Tamamura, S. Emori, Yoshio Watanabe, Isao Shimotsuhama, N. Kikuchi, W. Ishibashi, K. Tachibana
{"title":"4gb /s ECL栅极母片","authors":"M. Tamamura, S. Emori, Yoshio Watanabe, Isao Shimotsuhama, N. Kikuchi, W. Ishibashi, K. Tachibana","doi":"10.1109/CICC.1989.56757","DOIUrl":null,"url":null,"abstract":"The authors present a novel semicustom IC called the gate masterslice, which enables a clear eye pattern to be obtained for high-bit-rate signals. Key design features of the gate masterslice are: an advanced Si bipolar process, chip structure that reduces signal interference rather than increasing gate density, and internal connection using only the second metal layer","PeriodicalId":165054,"journal":{"name":"1989 Proceedings of the IEEE Custom Integrated Circuits Conference","volume":"45 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1989-05-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"4 Gb/s ECL gate masterslice\",\"authors\":\"M. Tamamura, S. Emori, Yoshio Watanabe, Isao Shimotsuhama, N. Kikuchi, W. Ishibashi, K. Tachibana\",\"doi\":\"10.1109/CICC.1989.56757\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The authors present a novel semicustom IC called the gate masterslice, which enables a clear eye pattern to be obtained for high-bit-rate signals. Key design features of the gate masterslice are: an advanced Si bipolar process, chip structure that reduces signal interference rather than increasing gate density, and internal connection using only the second metal layer\",\"PeriodicalId\":165054,\"journal\":{\"name\":\"1989 Proceedings of the IEEE Custom Integrated Circuits Conference\",\"volume\":\"45 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1989-05-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1989 Proceedings of the IEEE Custom Integrated Circuits Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CICC.1989.56757\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1989 Proceedings of the IEEE Custom Integrated Circuits Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CICC.1989.56757","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The authors present a novel semicustom IC called the gate masterslice, which enables a clear eye pattern to be obtained for high-bit-rate signals. Key design features of the gate masterslice are: an advanced Si bipolar process, chip structure that reduces signal interference rather than increasing gate density, and internal connection using only the second metal layer
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