F. Costanzo, R. Giofré, A. Salvucci, G. Polli, E. Limiti
{"title":"基于GaN on Si技术的4W 37.5-42.5 GHz功率放大器","authors":"F. Costanzo, R. Giofré, A. Salvucci, G. Polli, E. Limiti","doi":"10.1109/PRIME.2018.8430333","DOIUrl":null,"url":null,"abstract":"the design of a Q-band high power amplifier (HPA) in Microwave Monolithic Integrated Circuit (MMIC) technology is presented. The HPA is fabricated in a 100nm gate length Gallium Nitride on Silicon (GaN-Si) technology. The HPA, based on a four-stage architecture, was designed accounting for the de-rating rules foreseen for spatial use and to work in continuous wave (CW) conditions. Nevertheless, the realized HPA can provide a saturated output power larger than 36.5dBm with a gain and a power added efficiency higher than 22dB and 30%, respectively, in the operative band from 37.5GHz to 42.5GHz. The chip area is 3.54 × 3.5 mm2. Such results are in line with others state-of-art HPAs realized in more expensive GaN processes based on Silicon Carbide, thus demonstrating that high resistivity Silicon substrate can be efficiently adopted also in such a peculiar application.","PeriodicalId":384458,"journal":{"name":"2018 14th Conference on Ph.D. Research in Microelectronics and Electronics (PRIME)","volume":"101 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"A 4W 37.5-42.5 GHz Power Amplifier MMIC in GaN on Si Technology\",\"authors\":\"F. Costanzo, R. Giofré, A. Salvucci, G. Polli, E. Limiti\",\"doi\":\"10.1109/PRIME.2018.8430333\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"the design of a Q-band high power amplifier (HPA) in Microwave Monolithic Integrated Circuit (MMIC) technology is presented. The HPA is fabricated in a 100nm gate length Gallium Nitride on Silicon (GaN-Si) technology. The HPA, based on a four-stage architecture, was designed accounting for the de-rating rules foreseen for spatial use and to work in continuous wave (CW) conditions. Nevertheless, the realized HPA can provide a saturated output power larger than 36.5dBm with a gain and a power added efficiency higher than 22dB and 30%, respectively, in the operative band from 37.5GHz to 42.5GHz. The chip area is 3.54 × 3.5 mm2. Such results are in line with others state-of-art HPAs realized in more expensive GaN processes based on Silicon Carbide, thus demonstrating that high resistivity Silicon substrate can be efficiently adopted also in such a peculiar application.\",\"PeriodicalId\":384458,\"journal\":{\"name\":\"2018 14th Conference on Ph.D. Research in Microelectronics and Electronics (PRIME)\",\"volume\":\"101 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 14th Conference on Ph.D. Research in Microelectronics and Electronics (PRIME)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PRIME.2018.8430333\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 14th Conference on Ph.D. Research in Microelectronics and Electronics (PRIME)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PRIME.2018.8430333","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A 4W 37.5-42.5 GHz Power Amplifier MMIC in GaN on Si Technology
the design of a Q-band high power amplifier (HPA) in Microwave Monolithic Integrated Circuit (MMIC) technology is presented. The HPA is fabricated in a 100nm gate length Gallium Nitride on Silicon (GaN-Si) technology. The HPA, based on a four-stage architecture, was designed accounting for the de-rating rules foreseen for spatial use and to work in continuous wave (CW) conditions. Nevertheless, the realized HPA can provide a saturated output power larger than 36.5dBm with a gain and a power added efficiency higher than 22dB and 30%, respectively, in the operative band from 37.5GHz to 42.5GHz. The chip area is 3.54 × 3.5 mm2. Such results are in line with others state-of-art HPAs realized in more expensive GaN processes based on Silicon Carbide, thus demonstrating that high resistivity Silicon substrate can be efficiently adopted also in such a peculiar application.