扫描电镜覆盖计量研究

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI:10.1109/IMNC.1999.797541

T. Koike, T. Ikeda, H. Abe, F. Komatsu

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引用次数: 1

摘要

我们检查的准确性和精度基于sem覆盖计量的情况下，标记覆盖厚抗蚀膜。通过优化光束条件测量叠加误差，并与光学测量结果进行比较。

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An investigation of SEM overlay metrology

We examine the accuracy and precision of SEM-based overlay metrology in the case of marks covered with thick resist film. We measured the overlay error by optimizing beam condition, and compared the results with those obtained by optics-based measurement.

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来源期刊

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference

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