灵活紧凑的SOI-MOSFET模型HiSIM-SOI适用于任何结构类型

M. Miyake, S. Kusu, H. Kikuchihara, A. Tanaka, Y. Shintaku, M. Ueno, J. Nakashima, U. Feldmann, H. Mattausch, M. Miura-Mattausch, T. Yoshida
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引用次数: 3

摘要

我们开发了HiSIM-SOI模型,这是一个完整的基于表面电位的紧凑模型,适用于soi - mosfet的任何结构变化。本文主要研究如何计算FOX/ soi层表面、soi层/BOX表面和BOX/基板表面的三个表面电位值。研究了三变量牛顿迭代问题。由于对三个表面电位的初始猜测良好,迭代次数少,得到了准确的解。动态切换耗尽模式是通过考虑器件内所有可能产生的电荷来实现的。此外,100级NAND链的SPICE模拟表明,在任何偏置条件下,表面势牛顿迭代具有稳定的收敛性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The flexible compact SOI-MOSFET model HiSIM-SOI valid for any structural types
We have developed the HiSIM-SOI model which is a complete surface-potential-based compact model valid for any structural variations of SOI-MOSFETs. This work focuses on how to calculate the three surface-potential values at the FOX/SOI-layer surface, the SOI-layer/BOX surface, and the BOX/substrate surface. The Newton iteration with three variables is investigated. With good initial guesses of the three surface potentials, accurate solutions are obtained with small number of iterations. Dynamically switching depletion modes are achieved by considering all possible charges induced within the device explicitly. Furthermore, SPICE simulation of 100-stage NAND chains demonstrates stable convergence of the surface-potential Newton iteration for any bias conditions.
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