{"title":"新一代集成电路厂的微环境技术和自动化系统","authors":"M. Brain, S. Abuzeid","doi":"10.1109/ISSM.1994.729448","DOIUrl":null,"url":null,"abstract":"The integration of Minienvironment and SMIF Systems into IC fabrication provides new automation requirements and design possibilities. A scenario for an optimized, integrated Minienvironment and SMIF-based Automated facility is described and the benefits are analyzed. Recent data is presented comparing particulate contamination within various conventional open and minienvironment-based facilities worldwide.","PeriodicalId":114928,"journal":{"name":"International Symposium on Semiconductor Manufacturing, Extended Abstracts of ISSM","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1994-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Minienvironment Technology And Automation Systems For Next Generation IC Fabs\",\"authors\":\"M. Brain, S. Abuzeid\",\"doi\":\"10.1109/ISSM.1994.729448\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The integration of Minienvironment and SMIF Systems into IC fabrication provides new automation requirements and design possibilities. A scenario for an optimized, integrated Minienvironment and SMIF-based Automated facility is described and the benefits are analyzed. Recent data is presented comparing particulate contamination within various conventional open and minienvironment-based facilities worldwide.\",\"PeriodicalId\":114928,\"journal\":{\"name\":\"International Symposium on Semiconductor Manufacturing, Extended Abstracts of ISSM\",\"volume\":\"7 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1994-06-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Symposium on Semiconductor Manufacturing, Extended Abstracts of ISSM\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSM.1994.729448\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Symposium on Semiconductor Manufacturing, Extended Abstracts of ISSM","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.1994.729448","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Minienvironment Technology And Automation Systems For Next Generation IC Fabs
The integration of Minienvironment and SMIF Systems into IC fabrication provides new automation requirements and design possibilities. A scenario for an optimized, integrated Minienvironment and SMIF-based Automated facility is described and the benefits are analyzed. Recent data is presented comparing particulate contamination within various conventional open and minienvironment-based facilities worldwide.