16nm制程的动态与静态老化

Jeffrey Zhang, Antai Xu, D. Gitlin, Desmond Yeo
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引用次数: 1

摘要

随着汽车行业朝着自动驾驶和零缺陷的方向发展,生产老化变得更加重要,优化其效率也变得更加重要。虽然理论上动态老化被认为比静态老化更有效,但基于实际数据的研究报道很少。这项工作分析了使用台积电16nm工艺生产的约34k个单元的生产老化数据,并表明动态老化在捕获早期硅故障方面的有效性大约是静态老化的4倍
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dynamic vs Static Burn-in for 16nm Production
As the automotive industry moves toward autonomous driving and zero defect, production burn-in becomes more important, so is optimizing its efficiency. Although dynamic burn-in is considered more efficient than static in theory, there have been very few reported studies based on actual data. This work analyzes production burn-in data of ~34k units produced using TSMC’s 16nm process, and shows that dynamic burn-in is approximately >4x as effective as static burn-in in catching early silicon failures
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