集成毫秒和尖峰退火优化掺杂剂激活

2013 13th International Workshop on Junction Technology (IWJT) Pub Date : 2013-06-06 DOI:10.1109/IWJT.2013.6644512

Shiyu Sun, Shashank Sharma, K. V. Rao, B. Ng, D. Kouzminov, B. Colombeau, N. Variam, S. Muthukrishnan, A. Mayur, A. Brand

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引用次数: 1

摘要

探讨了退火顺序的影响(ms退火后脉冲退火vs. spike退火后ms退火)。还报道了大量退火顺序对掺杂剂活化的影响。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Integration of millisecond and spike anneals for dopant activation optimization

The effects of anneal sequences (ms anneal followed by spike anneal vs. spike anneal followed by ms anneal) were explored. Substantial anneal sequence effects on dopant activation were also reported.

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来源期刊

2013 13th International Workshop on Junction Technology (IWJT)

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