基于45nm技术的5G CMOS低噪声放大器设计

Vishniu. Ks, V. V
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引用次数: 1

摘要

本文采用45纳米工艺实现了两级块体CMOS (NMOS)低噪声放大器的比较设计。这些设计的放大器可以在24 - 30ghz的频率范围内工作。该放大器采用两级cascade配置和并联串联调峰实现。设计的Cascode结构与前馈技术、电流放血技术和差分结构的比较研究。在毫米波频带和毫米波频带中对电路的工作进行了增益、噪声、功耗和线性度的比较。采用不同的架构是为了在1.1V电源下实现高性能。该设计通过在两个级上使用两个NMOS晶体管来实现,以最小的晶体管宽度产生最大的跨导,从而使电路运行更快。采用前馈技术有助于降低噪声和功耗。电路在是德科技安捷伦设计系统软件包中使用45纳米预测技术模型(PTM)进行模拟。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design of CMOS Low Noise Amplifier for 5G Applications Using 45nm Technology
In this paper, the comparison design of a two-stage Bulk CMOS (NMOS) low noise amplifier is implemented using 45 nm technology. These designed amplifiers can operate at a frequency range of 24–30 GHz. The amplifier is implemented using two stage Cascode configuration and shunt series peaking. A comparative study of designed Cascode configuration with feedforward technique, current bleeding technique, and differential configuration. The operation of the circuits in the millimeter-wave frequency band and is compared for gain, noise, power consumption and linearity. The different architectures were implemented for high performance with a power supply of 1.1V. The design is implemented by using two NMOS transistors on both stages, producing maximum transconductance with a minimum transistor width, which in turn makes the circuit operate faster. The use of the feed-forward technique implemented has helped to reduce noise and power consumption. The circuits were stimulated in the Keysight Agilent Design System software package using a 45nm Predictive technology model (PTM).
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