纳米非晶硅的介电降低

Hussein K. Mejbel, Prof.Dr. Moafak Abdulrida
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引用次数: 0

摘要

计算了非晶硅量子点(1.8 ~ 12nm)介电衰减的理论值。这些计算表明,非晶硅量子点的介电常数受到抑制。此外,还研究了介电常数与频率的关系。介电常数随频率的变化与极化率和极化率的变化相似。介电常数由电子、原子和空间电荷极化的贡献组成。由于纳米半导体的带隙可以由非晶硅量子点的大小来控制,因此在本文的计算中采用了量子约束效应。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dielectric Reduction of Nanometric Amorphous Silicon
Theoretical values of in amorphous silicon quantum dots (1.8 – 12 nm)dielectric reduction have been calculated. These calculations presented that the dielectric constant of amorphous silicon quantum dots is suppressed. Also, it has been investigated the frequency dependence of the dielectric constant. The variation of the dielectric constant with frequency is similar to the variation of polarizability and polarization. The dielectric constant is made up of contributions from electronic, atomic, and space charge polarization. With the presented calculations, the effect of quantum confinement was adopted, since the bandgap of nano semiconductors can be governed by the size of amorphous silicon quantum dots.
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