T. Taniuchi, J. Kawakita, H. Shima, Yasuhisa Naito, H. Akinaga, Shik Shin
{"title":"基于激光的光电发射电子显微镜对ReRAM化学态的直接观察","authors":"T. Taniuchi, J. Kawakita, H. Shima, Yasuhisa Naito, H. Akinaga, Shik Shin","doi":"10.1109/EDTM.2018.8421513","DOIUrl":null,"url":null,"abstract":"We have demonstrated the imaging of buried chemical nanostructures. Laser-based photoemission electron microscopy has been set up for imaging with very high spatial resolution. Threshold photoemission using deep ultra violet light sources is expected to have very large probing depth (> 10 nm) due to small possibility of electron scattering in materials. Using this technique we have succeeded in visualization of filament structures of buried insulating oxide layers in ReRAM.","PeriodicalId":418495,"journal":{"name":"2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM)","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Direct Observation of Chemical States in ReRAM by Laser-based Photoemission Electron Microscopy\",\"authors\":\"T. Taniuchi, J. Kawakita, H. Shima, Yasuhisa Naito, H. Akinaga, Shik Shin\",\"doi\":\"10.1109/EDTM.2018.8421513\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We have demonstrated the imaging of buried chemical nanostructures. Laser-based photoemission electron microscopy has been set up for imaging with very high spatial resolution. Threshold photoemission using deep ultra violet light sources is expected to have very large probing depth (> 10 nm) due to small possibility of electron scattering in materials. Using this technique we have succeeded in visualization of filament structures of buried insulating oxide layers in ReRAM.\",\"PeriodicalId\":418495,\"journal\":{\"name\":\"2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM)\",\"volume\":\"30 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EDTM.2018.8421513\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EDTM.2018.8421513","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Direct Observation of Chemical States in ReRAM by Laser-based Photoemission Electron Microscopy
We have demonstrated the imaging of buried chemical nanostructures. Laser-based photoemission electron microscopy has been set up for imaging with very high spatial resolution. Threshold photoemission using deep ultra violet light sources is expected to have very large probing depth (> 10 nm) due to small possibility of electron scattering in materials. Using this technique we have succeeded in visualization of filament structures of buried insulating oxide layers in ReRAM.