亚微米InGaAs Esaki二极管具有创纪录的高峰值电流密度

D. Pawlik, M. Barth, P. Thomas, S. Kurinec, S. Mookerjea, D. Mohata, S. Datta, S. Cohen, D. Ritter, S. Rommel
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引用次数: 12

摘要

隧道场效应晶体管(ttfet)是一种门控Esaki隧道结(ETD),工作在齐纳状态下,理论上预测它可以在超低电源(<0.5 V)和陡峭的亚阈值斜率(<60 mV/dec)下工作[1,2]。然而,这些预测大多是基于未校准的TCAD模型做出的。为此,作者通过实验展示了一对具有最高峰值电流密度(JP = IP/Area)的InGaAs隧道二极管(975 kA/cm2或9.75 mA/µm2)的隧道二极管[3-5]。其他研究小组也曾尝试通过实验证明这些结构,但受到输出电流和串联电阻组合的限制[6]。本研究的关键创新是测试深亚微米Esaki二极管的过程[7],该过程减轻了这些因素。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Sub-micron InGaAs Esaki diodes with record high peak current density
Tunneling field effect transistors (TFET), which are gated Esaki tunnel junctions (ETD) operating in the Zener regime, have theoretically been predicted to operate with ultra low power supplies (<0.5 V) and steep subthreshold slopes (<60 mV/dec) [1, 2]. However, the majority of these projections have been made based on uncalibrated TCAD modeling. To this end, the authors experimentally demonstrate a pair of InGaAs tunnel diodes with the highest peak current densities (JP = IP/Area) ever reported for tunnel diodes (975 kA/cm2 or 9.75 mA/µm2) [3–5]. Other groups have attempted to experimentally demonstrate these structures, but were limited by a combination of output current and series resistance [6]. The key innovation in this study was a process for testing deep submicron Esaki diodes [7], which mitigates these factors.
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