高速低功耗0.1 /spl μ m以下GaAs电路中电子和空穴输运的蒙特卡罗研究

Y. Awano, Y. Tagawa, M. Shima
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引用次数: 1

摘要

为了评价互补GaAs器件的高速和低功耗性能,从理论上研究了超短通道中的电子和空穴输运。对低于0.1 /spl mu/m的器件进行蒙特卡罗模拟表明,在100 kV/cm的电场下,GaAs中的峰值电子速度达到硅中的4倍以上,表明GaAs器件在高频应用中的显著优势。建立了一种新的空穴输运蒙特卡罗模拟模型,该模型不仅包括重空穴和轻空穴,还包括分离带空穴。据我们所知,这是第一次计算出这三个波段的空穴的精确散射概率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Monte Carlo study of electron and hole transport for high speed and low-power sub-0.1 /spl mu/m GaAs circuits
In order to evaluate high-speed and low-power performance of complementary GaAs devices, electron and hole transport in an ultra-short channel have been studied theoretically. Monte Carlo simulations for sub-0.1 /spl mu/m devices show that, under the electric field of 100 kV/cm, the peak electron velocity in GaAs reaches a value more than 4 times higher than that in silicon, indicating the significant advantages of GaAs devices for high-frequency applications. We developed a new model for Monte Carlo simulation of hole transport, which includes not only heavy and light holes, but also split-off band holes. To the best of our knowledge, this is the first time that the accurate scattering probabilities of holes of these three bands have been calculated.
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