改性单宁酸光刻胶图案化的新型金属化方法†。

Industrial Chemistry & Materials Pub Date : 2023-08-15 DOI:10.1039/D3IM00066D

Zicheng Tang, Xubin Guo, Haihua Wang, Huan Chen and Wenbing Kang

{"title":"改性单宁酸光刻胶图案化的新型金属化方法†。","authors":"Zicheng Tang, Xubin Guo, Haihua Wang, Huan Chen and Wenbing Kang","doi":"10.1039/D3IM00066D","DOIUrl":null,"url":null,"abstract":"Metal patterning from a modified tannic acid (TA-Boc-MA) photoresist and the processes are designed using protection of hydroxyl groups in tannic acid, formulation into a photoresist, an exposure and pattern treatment process, and metallization by electroless Ag deposition with silver ion solution.Keywords: Tannic acid; Positive photoresist; Metallization method; Metal patterning; Ag pattern.","PeriodicalId":29808,"journal":{"name":"Industrial Chemistry & Materials","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2023-08-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2024/im/d3im00066d?page=search","citationCount":"0","resultStr":"{\"title\":\"A new metallization method of modified tannic acid photoresist patterning†\",\"authors\":\"Zicheng Tang, Xubin Guo, Haihua Wang, Huan Chen and Wenbing Kang\",\"doi\":\"10.1039/D3IM00066D\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Metal patterning from a modified tannic acid (TA-Boc-MA) photoresist and the processes are designed using protection of hydroxyl groups in tannic acid, formulation into a photoresist, an exposure and pattern treatment process, and metallization by electroless Ag deposition with silver ion solution.Keywords: Tannic acid; Positive photoresist; Metallization method; Metal patterning; Ag pattern.\",\"PeriodicalId\":29808,\"journal\":{\"name\":\"Industrial Chemistry & Materials\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-08-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://pubs.rsc.org/en/content/articlepdf/2024/im/d3im00066d?page=search\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Industrial Chemistry & Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://pubs.rsc.org/en/content/articlelanding/2024/im/d3im00066d\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Industrial Chemistry & Materials","FirstCategoryId":"1085","ListUrlMain":"https://pubs.rsc.org/en/content/articlelanding/2024/im/d3im00066d","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

利用改性单宁酸（TA-Boc-MA）光刻胶进行金属图案化，并设计了保护单宁酸中的羟基、配制成光刻胶、曝光和图案处理工艺，以及利用银离子溶液进行无电解银沉积的金属化工艺：单宁酸；正光刻胶；金属化方法；金属图案化；银图案。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

A new metallization method of modified tannic acid photoresist patterning†

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A new metallization method of modified tannic acid photoresist patterning†

Metal patterning from a modified tannic acid (TA-Boc-MA) photoresist and the processes are designed using protection of hydroxyl groups in tannic acid, formulation into a photoresist, an exposure and pattern treatment process, and metallization by electroless Ag deposition with silver ion solution.

Keywords: Tannic acid; Positive photoresist; Metallization method; Metal patterning; Ag pattern.

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Industrial Chemistry & Materials chemistry, chemical engineering, functional materials, energy, etc.-

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