700V横向DMOS的占空比加速热载流子退化和寿命评估

Siyang Liu, Zhichao Li, Wangran Wu, Weifeng Sun, Shulang Ma, Yuwei Liu, Wei Su, Xiaohong Liu
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引用次数: 2

摘要

由于自热效应严重,传统的直流应力难以用于评价600V以上LDMOS的热载子降解。本文采用栅极占空比加速交流应力的方法研究了724v击穿LDMOS的热载流子降解。结果表明,栅极脉冲高时,在漏极附近产生热电子注入和类供体界面态。当栅脉冲为零时,没有明显的退化和恢复。此外,短脉冲边缘增强了瞬态热孔注入鸟喙的导通电阻(Ron)的减小。根据所提出的有关占空比的模型,计算了器件寿命。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Duty-cycle-accelerated hot-carrier degradation and lifetime evaluation for 700V lateral DMOS
Due to serious self-heating effect, traditional DC stress is hard to be used for evaluating the hot-carrier degradation of the LDMOS above 600V. In this work, the hot-carrier degradation for a 724V-breakdown LDMOS is studied by adopting gate duty-cycle-accelerated AC stress. It demonstrates that hot-electrons injection and donor-like interface states generation happen near the drain when the gate pulse is high. No obvious degradation and recovery can be observed when the gate pulse is zero. Moreover, the short pulse edges enhance the decrease of on-resistance (Ron) due to transient hot-holes injection into bird's beak. The device lifetime is also calculated according to the proposed models related to duty-cycle.
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