氮化镓HEMT模型和包括温度依赖的参数提取的贡献

Loukas Chevas, N. Makris, M. Kayambaki, A. Kostopoulos, A. Stavrinidis, G. Konstantinidis, M. Bucher
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引用次数: 0

摘要

高电子迁移率晶体管(hemt)的使用越来越多,特别是使用GaN,用于大范围的应用,需要高效的电路设计模型。本文讨论了用于电路设计的基于物理的HEMT模型的关键参数的确定过程。在IESL-FORTH制造的Si衬底上采用AlGaN/GaN外延的hemt。基本参数,如阻挡电容,阈值电压,斜率因子和迁移率是由实验特性在很大的温度范围内确定的。结果表明,hemt的跨导效率在许多方面与mosfet相似。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Contribution to GaN HEMT Modeling and Parameter Extraction Including Temperature Dependence
The increased usage of high electron mobility transistors (HEMTs), especially using GaN, for a large range of applications demands for efficient circuit design models. The paper discusses the procedures for determining key parameters of a physics-based HEMT model for circuit design. HEMTs using AlGaN/GaN epitaxy on Si substrate fabricated at IESL-FORTH are used. Basic parameters such as barrier capacitance, threshold voltage, slope factor, and mobility are determined from experimental characteristics over a large range of temperature. It is shown that the behavior of HEMTs, in terms of transconductance efficiency, is in many ways similar to that of MOSFETs.
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