角化对先进技术节点GAA纳米片场效应管量子约束的影响

Anirban Kar, S. Sarker, A. Dasgupta, Y. Chauhan
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引用次数: 0

摘要

由于更好的静电控制,半导体行业已经在即将到来的技术节点上采用栅极全能场效应管(gaafet)。子带量化、阈值电压偏移、几何依赖态密度(DOS)等效应在gaafet的终端特性中占主导地位,这对器件的模拟和射频特性都有重大影响。在本文中,我们首次证明了圆角半径$(r_{c})$对量子约束效应的影响,量子约束效应改变了信道的子带量子化水平。我们使用二维薛定谔求解器获得了子带能级,并使用BSIM-CMG框架预测了子带量化对器件终端特性的影响,即电容、漏极电流和跨导与r_{c}$变化有关。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impact of Corner Rounding on Quantum Confinement in GAA Nanosheet FETs for Advanced Technology Nodes
Due to the better electrostatic control, semiconductor industry has already adopted gate-all-around FETs (GAAFETs) for upcoming technology nodes. Effects like sub-band quantization, threshold voltage shift, the geometry-dependent density of states (DOS) etc., are predominant in the terminal characteristics of GAAFETs due to strong geometrical confinement, which has a significant impact on both analog and RF characteristics of the device. In this paper, for the first time we demonstrate the impact of corner rounding radius $(r_{c})$ on quantum confinement effects which alter the sub-band quantization levels of the channel. We have used a 2D Schrodinger solver to obtain the sub-band energy levels and used BSIM-CMG framework to predict the effect of sub-band quantization on the terminal characteristics of the device viz. capacitances, drain currents and transconductances with respect to $r_{c}$ variations.
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