激光光电注入内节点时间裕度分析的可靠性/设计评估

D. J. Burns, Mark T. Pronobis, C. Eldering, Robert J. Hillman
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引用次数: 12

摘要

讨论了一种新的器件分析技术,该技术可用于高时钟速率VLSI电路中关键时序路径的表征和时序相关失效模式的分析。在测试器件时,使用聚焦激光器在单个晶体管的漏极注入局部光电流。研究了由此产生的对电路性能的影响,并表明可以通过这种方式增加单个电路路径的传播延迟。为了给测量值赋一个相对值,可以改变工作频率、电源电压或注入的光电流水平,而其他固定不变,直到设备失效。文中给出了该技术在简单栅极上的模型、电路仿真和实验结果,以及在CMOS微处理器上的测量结果。除了分析频率敏感故障之外,该技术的可能应用包括在电路中实验定位性能限制时序路径,以及评估电路对影响时序的工艺或故障机制引起的器件参数漂移的灵敏度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reliability/Design Assessment by Internal-Node Timing-Margin Analysis using Laser Photocurrent-Injection
A new device analysis technique is discussed which may prove useful in characterizing critical timing paths and analyzing timing related failure modes in high clock rate VLSI circuits. A focussed laser is used to inject localized photocurrent at the drain of a single transistor as the device is tested. The resulting effects on circuit performance have been studied and it is shown that individual circuit path propagation delays can be increased in this manner. To assign a relative value to a measurement, the operating frequency, power supply voltage or injected photocurrent level can be varied with the others fixed until the device just fails. Models, circuit simulations and experimental results obtained using this technique on a simple gate and results measured on CMOS microprocessors are given in this paper. Possible applications of the technique beyond the analysis of frequency sensitive failures include experimentally locating performance limiting timing paths in a circuit and assessing a circuit's sensitivity to process or failure mechanism induced drifts in device parameters which affect timing.
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