氮化镓中的电流传导路径

H. Morkoç, A. Baski, R. Molnar, J. Jasinski, Z. Liliental-Weber
{"title":"氮化镓中的电流传导路径","authors":"H. Morkoç, A. Baski, R. Molnar, J. Jasinski, Z. Liliental-Weber","doi":"10.1109/ISCS.2003.1239925","DOIUrl":null,"url":null,"abstract":"Studies current conduction using C-AFM on a variety of GaN samples grown by MBE and HVPE on sapphire, both before and after performing chemical etches to delineate defect structures. Samples employed both side ohmic contacts and a conventional Schottky barrier configuration. The results indicate that the major current conduction paths in forward direction below the threshold of the metal-semiconductor junction turn-on are associated with prismatic planes. The same is true for the reverse current case. The Schottky barrier experiments indicate the planarized surfaces exhibit much lower excess current.","PeriodicalId":404065,"journal":{"name":"2003 International Symposium on Compound Semiconductors","volume":"115 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Current conduction paths in GaN\",\"authors\":\"H. Morkoç, A. Baski, R. Molnar, J. Jasinski, Z. Liliental-Weber\",\"doi\":\"10.1109/ISCS.2003.1239925\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Studies current conduction using C-AFM on a variety of GaN samples grown by MBE and HVPE on sapphire, both before and after performing chemical etches to delineate defect structures. Samples employed both side ohmic contacts and a conventional Schottky barrier configuration. The results indicate that the major current conduction paths in forward direction below the threshold of the metal-semiconductor junction turn-on are associated with prismatic planes. The same is true for the reverse current case. The Schottky barrier experiments indicate the planarized surfaces exhibit much lower excess current.\",\"PeriodicalId\":404065,\"journal\":{\"name\":\"2003 International Symposium on Compound Semiconductors\",\"volume\":\"115 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2003-10-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2003 International Symposium on Compound Semiconductors\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISCS.2003.1239925\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2003 International Symposium on Compound Semiconductors","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISCS.2003.1239925","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

利用C-AFM研究了由MBE和HVPE在蓝宝石上生长的各种GaN样品在进行化学蚀刻以描绘缺陷结构之前和之后的电流传导。样品采用了两侧欧姆接触和传统的肖特基势垒结构。结果表明,在金属-半导体结导通阈值以下的正向电流传导路径主要与棱柱面相关。对于反向电流的情况也是如此。肖特基势垒实验表明,平面化表面表现出更低的过量电流。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Current conduction paths in GaN
Studies current conduction using C-AFM on a variety of GaN samples grown by MBE and HVPE on sapphire, both before and after performing chemical etches to delineate defect structures. Samples employed both side ohmic contacts and a conventional Schottky barrier configuration. The results indicate that the major current conduction paths in forward direction below the threshold of the metal-semiconductor junction turn-on are associated with prismatic planes. The same is true for the reverse current case. The Schottky barrier experiments indicate the planarized surfaces exhibit much lower excess current.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信