C2L:一种新的高速、高密度体CMOS技术

A. Dingwall, R. Stricker
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引用次数: 13

摘要

C2L是一种新的高速COS/MOS结构方法,可以显著提高速度和封装密度。RCA固态事业部最近宣布的CDP 1802单片8位微处理器以及几种存储器和I/O电路都是采用这种称为C2L或Closed COS/MOS Logic的新型批量CMOS技术制造的。C2L是一种自对准硅栅CMOS技术,其中栅极完全包围漏极。该技术不需要标准铝门CMOS的传统保护带,因此显着增加了封装密度和器件速度,并且仍然保留了CMOS的固有优势(非常低的静态功耗,高抗噪性和工作电压从3到15伏,温度范围从-55°C到125°C)。介绍了C2L器件的基本结构,并与标准铝门CMOS进行了比较。讨论了C2L器件的速度优势,并给出了C2L电路与同类标准CMOS器件性能的比较数据。一般来说,C2L器件的封装密度比标准CMOS提高了3倍,工作频率比标准CMOS快4到6倍。C2L器件的制造顺序需要6个光掩膜(比标准CMOS少一个)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
C2L: A new high speed, high density bulk CMOS technology
A new structural approach to high speed COS/MOS, C2L, results in significant speed and packing density gains. The CDP 1802, single-chip, 8-bit microprocessor as well as several memory and I/O circuits announced recently by the RCA Solid State Division are fabricated in this new bulk CMOS technology, called C2L or Closed COS/MOS Logic. C2L is a self-aligned silicon gate CMOS technology where the gate completely surrounds the drain. This technique does not require the conventional guardbands of standard Al-gate CMOS and thereby significantly increases packing density as well as device speed, and still retains the inherent advantages of CMOS (very low static power dissipation, high noise immunity and operating voltage from 3 to 15 volts at temperatures ranging from -55°C to 125°C). The basic C2L device structure is presented and compared to standard Al-gate CMOS. The speed advantages of C2L devices are discussed, and data comparing the performance of C2L circuits with comparable standard CMOS devices is presented. Generally, C2L devices show an improvement in packing density by a factor of 3 over standard CMOS and operate at frequencies approximately 4 to 6 times faster than standard CMOS. The fabrication sequence for C2L devices requires 6 photomasks (one less than standard CMOS).
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