单轴应变和静水压力对InSb薄层性能的影响

Анатолій Олександрович Дружинін, І. Й. Мар’ямова, О. П. Кутраков, Н. С. Лях-Кагуй
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引用次数: 0

摘要

在应变(ε =±1.3 × 10-3 rel.un .)和温度(180 ÷ + 100)°С的大范围内,研究了不同浓度碲掺杂和未掺杂的InSb薄层的压阻特性。在碲掺杂浓度为(4 ÷ 7) × 1016 см-3的n型电导率InSb薄层中,测量因子最高。应变片的敏感元件可以在这些层的基础上制造出来。研究了静水压力高达5000 bar对未掺杂和掺杂碲锌InSb薄层电物理性能的影响。这些层的静水压力系数值及其与温度的关系在温度范围(75 ÷ + 80)°С内确定。锌掺杂的InSb样品对静水压力的敏感性最大(K20°С≈46)。给出了使用InSb薄层作为压力传感器敏感元件的建议。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
THE INFLUENCE OF UNIAXIAL STRAIN AND HYDROSTATIC PRESSURE ON PROPERTIES OF InSb THIN LAYERS
Piezoresistive characteristics of undoped and doped by tellurium with different concentration InSb thin layers were studied in wide range of strain (ε = ± 1.3 × 10-3 rel. un.) and temperature (180 ÷ + 100) °С. The highest values of the gauge factor were obtained in n-type conductivity InSb thin layers doped by tellurium to concentration of (4 ÷ 7) × 1016 см-3. Sensitive elements of strain gauges could be created on the basis of such layers. The influence of hydrostatic pressure up to 5000 bar on electrophysical properties of undoped and doped by tellurium and zinc InSb thin layers were also studied. The values of the hydrostatic pressure coefficients for these layers and their temperature dependences were determined in the temperature range (75 ÷ + 80) °С. The greatest sensitivity to hydrostatic pressure (K20°С ≈ 46) was revealed in InSb samples doped with zinc. Recommendations for the use of InSb thin layers as sensitive elements of pressure sensors were given.
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