用于BIMOS VLSI的双极结构

E. Hamdy, M. Elmasry
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引用次数: 1

摘要

VLSI的最新进展为在同一芯片上混合MOSFET和双极集成结构提供了许多可能性。本工作的目的是研究双极结构在BIMOS VLSI环境下的集成。更具体地说,在给定MOS技术的约束和指导下,研究了双极结构;例如,不存在n+下层,以及高外延(衬底)电阻率。提出了一种基于多集电极p-n-p晶体管和多发射极n-p-n晶体管合并的双极结构。该结构充分利用了MOS芯片上时钟信号的可用性。它可以实现模拟、逻辑、存储和数字功能。计算机仿真和实验结果表明,该结构可以在各种BIMOS VLSI技术中有效地发挥作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Bipolar structures for BIMOS VLSI
Recent advances in VLSI has offered many possibilities in mixing MOSFET and Bipolar integrated structures on the same chip. The purpose of this work is to study the integration of bipolar structures in BIMOS VLSI environments. More specifically bipolar structures are studied under the constraints and guidelines of a given MOS technology; e.g. the non-exsistance of a n+underlayer, and the high epitaxial (substrate) resistivity. A bipolar structure, based on merging a multicollector p-n-p transistor with a multiemitter n-p-n transistor is proposed. The structure takes advantage of the availability of clock signals on a MOS chip. It can be used to realise analog, logic, memory, and digital functions. Computer simulation as well as experimental results, show that the structure can perform efficiently in a wide range of BIMOS VLSI technologies.
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