一种新型的基于扫描电镜图像的先进光刻工艺控制,提供快速反馈

Xuedong Fan, Lijun Chen, Jun Zhu, Haichang Zheng, Xiaolong Wang, Yancong Ge, Yu Zhang, A. Vikram, Guojie Cheng, Hui Wang, Qing Zhang, Wenkui Liao
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引用次数: 1

摘要

光刻工艺工具的稳定性是半导体器件制造的基础。采用了几种工艺控制方法对光刻阶段的每一个工艺层进行鉴定和监控。关键尺寸扫描电子显微镜(CDSEM)对计量特征的测量和过程窗口确认的器件特征的光学检查和DRSEM(缺陷评审扫描电子显微镜)是常规过程控制的一部分。在这里,我们采用了一种新颖的PSD(过程稳定性诊断)解决方案,该解决方案使用CDSEM或DRSEM图像提供详细的Bossung图,如设备特征分析。这提供了对过程行为的快速洞察,还可以识别任何偏差的根本原因。本文将讨论焦深、最佳焦的监测以及像散、球差等透镜参数的诊断。我们描述了从高分辨率图像中提取相关参数并建立这些关键指标自动监控的方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A novel SEM image based advanced lithography process control providing quick feedback
The stability of photolithography process tool is the fundamental to the fabrication of semiconductor devices. Several process control methods are employed to qualify and then monitor every single process layer at the photolithography stage. The CDSEM (Critical Dimension Scanning Electron Microscope) measurements on metrology features and the optical inspection and DRSEM (Defect Review Scanning Electron Microscope) on device features for Process Window Qualification is part of the conventional process control. Here we employed a novel PSD (Process Stability Diagnosis) solution that provides detailed Bossung plot like analysis on device features using CDSEM or DRSEM images. This provides quick insight into the process behavior and also identifies the root cause for any deviation. In this paper we will discuss about monitoring the depth of focus and the best focus as well as diagnosis for lens parameters like astigmatism and spherical aberration. We describe the method of extracting relevant parameters from high resolution images and establishing an automatic monitor for these critical indicators.
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