用于ATLAS微带板的高压多路复用的高压硅JFET

G. Giacomini, Wei Chen, D. Lynn
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引用次数: 2

摘要

我们提出了一种新的硅器件:高压垂直JFET,最初被认为是硅微带内跟踪器(ITk) ATLAS升级中的高压多路复用开关的候选器件。通过数值模拟,对该装置的几何形状和工艺流程进行了发展,证实了该装置的可行性。利用平面工艺流程,在布鲁克海文国家实验室的硅加工设备中,从严格规格的外延片开始,成功地制造了n型和p型hv - jfet。探测站对未辐照器件的测量结果显示,在OFF状态下泄漏电流小,击穿电压高(可达600V),在ON状态下电流大。因此,这些jfet满足高压多路复用开关所需的大部分规格。然而,只有质子和中子的辐照活动才能评估它们作为抗辐射开关的适用性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High-Voltage Silicon JFET for HV Multiplexing for the ATLAS MicroStrip Staves
We present a new kind of silicon device: a High-Voltage vertical JFET, originally conceived as a candidate for the High-Voltage Multiplexing switch in the ATLAS upgrade of the silicon microstrip Inner Tracker (ITk). The development of the geometry as well as of the technology process flow was carried out by the help of numerical simulations, which confirmed the feasibility of such a device. Using a planar process flow, both n-type and p-type HV-JFETs have been successfully fabricated in the silicon processing facility of Brookhaven National Laboratory, starting from epitaxial wafers which have been grown according to strict specifications. Probe station measurements of un-irradiated devices show low leakage current and high breakdown voltage (up to 600V) in the OFF state, and high currents in the ON state. These JFETs, thus, satisfy most of the specs required by the HV Multiplexing switch. However, only irradiation campaigns with protons and neutrons will assess their suitability as rad-hard switches.
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