横向结构氧化锌基记忆电阻器件的开关行为

R. Abu Bakar, M. Nazmi, Awatif Harun, N. Kamarozaman, N. Shaari, S. M. M. Kasim, S. H. Herman
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引用次数: 1

摘要

研究了一种基于氧化锌(ZnO)的横向结构忆阻器。研究了氧化物和电极尺寸变化对开关行为的影响。通过在玻璃基板的右端和左端沉积金属电极形成横向结构。采用溶胶-凝胶自旋镀膜技术将ZnO薄膜沉积在金属涂层基底的正中央。氧化物和电极的宽度是不同的。我们观察到,使用最小的氧化物宽度与宽的电极尺寸相结合,可以获得更好的记忆行为。随着电极宽度的增加,导通和关断电阻(RON和ROFF)的值均减小。滞后曲线随着电极宽度的增大而变宽。ROFF/RON比值计算为1.044。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Switching behavior of lateral-structured zinc oxide-based memristive device
Lateral-structured zinc oxide (ZnO) based memristive device was studied. The effect of oxide and electrode size variations on the switching behavior was investigated. The lateral structure was formed by depositing the metal electrodes at the right and left ends of a glass substrate. The ZnO thin films were deposited right at the center of the metal coated substrate using sol-gel spin coating technique. The oxide and electrode widths were varied. It was observed that using the smallest oxide width in the combination with wide electrode size resulted in better memristive behavior. The values of both on and off resistances (RON and ROFF) were found to be decreased as the width of the electrode increasing. The hysteresis curve on the other hand became wider with the increases of electrode width. The ROFF/RON ratio was calculated to be 1.044.
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