{"title":"基于溶液和低温液体的x射线和EUV液体-喷射目标激光等离子体源","authors":"B. Hansson, L. Rymell, M. Berglund, H. Hertz","doi":"10.1109/IMNC.1999.797496","DOIUrl":null,"url":null,"abstract":"Here we report on new experiments, extending the laser produced plasma source's applicability for lithography by producing liquid-jet targets of substances that are gases or solids at normal pressure and temperature. This development is important since new wavelength ranges become accessible. Furthermore, the possibility to chose high-Z target material should lead to higher conversion efficiencies.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"319 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"X-ray and EUV liquid-jet-target laser-plasma sources based on solutions and cryogenic liquids\",\"authors\":\"B. Hansson, L. Rymell, M. Berglund, H. Hertz\",\"doi\":\"10.1109/IMNC.1999.797496\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Here we report on new experiments, extending the laser produced plasma source's applicability for lithography by producing liquid-jet targets of substances that are gases or solids at normal pressure and temperature. This development is important since new wavelength ranges become accessible. Furthermore, the possibility to chose high-Z target material should lead to higher conversion efficiencies.\",\"PeriodicalId\":120440,\"journal\":{\"name\":\"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference\",\"volume\":\"319 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-07-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMNC.1999.797496\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.1999.797496","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
X-ray and EUV liquid-jet-target laser-plasma sources based on solutions and cryogenic liquids
Here we report on new experiments, extending the laser produced plasma source's applicability for lithography by producing liquid-jet targets of substances that are gases or solids at normal pressure and temperature. This development is important since new wavelength ranges become accessible. Furthermore, the possibility to chose high-Z target material should lead to higher conversion efficiencies.