基于溶液和低温液体的x射线和EUV液体-喷射目标激光等离子体源

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI:10.1109/IMNC.1999.797496

B. Hansson, L. Rymell, M. Berglund, H. Hertz

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引用次数: 0

摘要

在这里，我们报告了新的实验，通过在常压常温下产生气体或固体物质的液体喷射靶，扩大了激光产生等离子体源在光刻中的适用性。这一发展是重要的，因为新的波长范围可以获得。此外，选择高z目标材料的可能性将导致更高的转换效率。

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X-ray and EUV liquid-jet-target laser-plasma sources based on solutions and cryogenic liquids

Here we report on new experiments, extending the laser produced plasma source's applicability for lithography by producing liquid-jet targets of substances that are gases or solids at normal pressure and temperature. This development is important since new wavelength ranges become accessible. Furthermore, the possibility to chose high-Z target material should lead to higher conversion efficiencies.

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Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference

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