{"title":"采用接触光刻技术的硅光子线","authors":"O. Horn, J. Mueller, T. Lipka, J. Amthor","doi":"10.1109/GROUP4.2008.4638165","DOIUrl":null,"url":null,"abstract":"In this paper a simple contact lithography with i-line or DUV is used for the production of photonic wires, which are additionally smoothed and shrunk by thermal oxidation.","PeriodicalId":210345,"journal":{"name":"2008 5th IEEE International Conference on Group IV Photonics","volume":"183 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-10-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Silicon photonic wires using contact lithography\",\"authors\":\"O. Horn, J. Mueller, T. Lipka, J. Amthor\",\"doi\":\"10.1109/GROUP4.2008.4638165\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper a simple contact lithography with i-line or DUV is used for the production of photonic wires, which are additionally smoothed and shrunk by thermal oxidation.\",\"PeriodicalId\":210345,\"journal\":{\"name\":\"2008 5th IEEE International Conference on Group IV Photonics\",\"volume\":\"183 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-10-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 5th IEEE International Conference on Group IV Photonics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/GROUP4.2008.4638165\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 5th IEEE International Conference on Group IV Photonics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GROUP4.2008.4638165","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
In this paper a simple contact lithography with i-line or DUV is used for the production of photonic wires, which are additionally smoothed and shrunk by thermal oxidation.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
