{"title":"AlGaN/GaN异质结器件的电性能:全量子研究","authors":"L. Lucci, Jean-Charles Barb, M. Pala","doi":"10.1109/ESSDERC.2015.7324778","DOIUrl":null,"url":null,"abstract":"In this contribution a full-quantum simulation of the electron transport in the two-dimensional electron gas (2DEG) of a AlGaN/GaN heterostructure is carried out using the non-equilibrium Green function (NEGF) approach. Even if electrical and mechanical properties of a AlGaN/GaN heterojunction are now well understood, a host of techniques like thinning of layers as in gate recess, use of advance materials like high-k dielectrics, introduction of back-barriers or channel interfaces, are considerably intricating the physical modeling of the heterojunction and precise simulations that correctly take into account for physical effects at the nano-scale are deemed necessary. In this study the quantum-mechanical effects in the electron transport layer properties are accounted for both in the quantization and in the transport direction. First, we focus in particular to a comparative study of the threshold voltage formation. We then we address the gate scaling, identifying the channel length at which short-channel-effects may be nonnegligible any more.","PeriodicalId":332857,"journal":{"name":"2015 45th European Solid State Device Research Conference (ESSDERC)","volume":"145 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-11-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Electric performance of AlGaN/GaN heterojunction devices: A full-quantum study\",\"authors\":\"L. Lucci, Jean-Charles Barb, M. Pala\",\"doi\":\"10.1109/ESSDERC.2015.7324778\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this contribution a full-quantum simulation of the electron transport in the two-dimensional electron gas (2DEG) of a AlGaN/GaN heterostructure is carried out using the non-equilibrium Green function (NEGF) approach. Even if electrical and mechanical properties of a AlGaN/GaN heterojunction are now well understood, a host of techniques like thinning of layers as in gate recess, use of advance materials like high-k dielectrics, introduction of back-barriers or channel interfaces, are considerably intricating the physical modeling of the heterojunction and precise simulations that correctly take into account for physical effects at the nano-scale are deemed necessary. In this study the quantum-mechanical effects in the electron transport layer properties are accounted for both in the quantization and in the transport direction. First, we focus in particular to a comparative study of the threshold voltage formation. We then we address the gate scaling, identifying the channel length at which short-channel-effects may be nonnegligible any more.\",\"PeriodicalId\":332857,\"journal\":{\"name\":\"2015 45th European Solid State Device Research Conference (ESSDERC)\",\"volume\":\"145 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-11-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 45th European Solid State Device Research Conference (ESSDERC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ESSDERC.2015.7324778\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 45th European Solid State Device Research Conference (ESSDERC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSDERC.2015.7324778","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Electric performance of AlGaN/GaN heterojunction devices: A full-quantum study
In this contribution a full-quantum simulation of the electron transport in the two-dimensional electron gas (2DEG) of a AlGaN/GaN heterostructure is carried out using the non-equilibrium Green function (NEGF) approach. Even if electrical and mechanical properties of a AlGaN/GaN heterojunction are now well understood, a host of techniques like thinning of layers as in gate recess, use of advance materials like high-k dielectrics, introduction of back-barriers or channel interfaces, are considerably intricating the physical modeling of the heterojunction and precise simulations that correctly take into account for physical effects at the nano-scale are deemed necessary. In this study the quantum-mechanical effects in the electron transport layer properties are accounted for both in the quantization and in the transport direction. First, we focus in particular to a comparative study of the threshold voltage formation. We then we address the gate scaling, identifying the channel length at which short-channel-effects may be nonnegligible any more.