V. Bhagwat, J. Langer, I. Bhat, P. Dutta, T. Refaat, M. Abedin
{"title":"GaSb光电二极管干等离子体和湿化学钝化的比较","authors":"V. Bhagwat, J. Langer, I. Bhat, P. Dutta, T. Refaat, M. Abedin","doi":"10.1109/ISCS.2003.1239964","DOIUrl":null,"url":null,"abstract":"In this paper, the effect of ammonium sulfide passivation on the wet etched sample is reported. The device performance in terms of leakage current breakdown voltage, zero bias resistance area product and responsivity for the diodes is reviewed.","PeriodicalId":404065,"journal":{"name":"2003 International Symposium on Compound Semiconductors","volume":"37 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A comparison of dry plasma and wet chemical passivation of GaSb photodiodes\",\"authors\":\"V. Bhagwat, J. Langer, I. Bhat, P. Dutta, T. Refaat, M. Abedin\",\"doi\":\"10.1109/ISCS.2003.1239964\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, the effect of ammonium sulfide passivation on the wet etched sample is reported. The device performance in terms of leakage current breakdown voltage, zero bias resistance area product and responsivity for the diodes is reviewed.\",\"PeriodicalId\":404065,\"journal\":{\"name\":\"2003 International Symposium on Compound Semiconductors\",\"volume\":\"37 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2003-10-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2003 International Symposium on Compound Semiconductors\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISCS.2003.1239964\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2003 International Symposium on Compound Semiconductors","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISCS.2003.1239964","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A comparison of dry plasma and wet chemical passivation of GaSb photodiodes
In this paper, the effect of ammonium sulfide passivation on the wet etched sample is reported. The device performance in terms of leakage current breakdown voltage, zero bias resistance area product and responsivity for the diodes is reviewed.