液氮温度下GaAs栅极sisfet的s参数表征

Y. Kwark, P. Solomon, D. La Tulipe
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引用次数: 6

摘要

sisfet在室温和液氮(LN)温度下进行了表征,以评估其动态性能。将低频参数测量得到的等效电路参数与s参数测量得到的等效电路参数进行了比较。测量是在一个分叉的闸门结构上进行的,该结构由两个相同的闸门手指组成,宽度为70 μ m。器件的微波特性依赖于使用HP8510B网络分析仪和级联探头在50 mhz -26 ghz范围内测量s参数。sisfet的室温和低温特性没有显示出异常行为的证据。微波测量得到的等效电路参数与低频测量得到的等效电路参数基本一致。低栅极泄漏,改善的g/sub m/和不变的栅极电容导致在LN温度下的高f/sub T/,表明数字系统性能增强的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
S-parameter characterization of GaAs gate SISFETs at liquid nitrogen temperatures
SISFETs where characterized at both room and liquid nitrogen (LN) temperatures to evaluate their dynamic performance. Equivalent circuit parameters obtained from low-frequency parametric measurements were compared to those deduced from S-parameter measurements. The measurements were made on a bifurcated gate structure consisting of two identical gate fingers totalling 70 mu m in width. Microwave characterization of the devices relied on measurement of the S-parameters over a 50-MHz-26-GHz range using an HP8510B network analyzer and cascade probes. The room- and LN-temperature characterization of SISFETs shows no evidence of anomalous behavior. The equivalent circuit parameters deduced from microwave measurements are consistent with those derived from the low-frequency measurements. The low gate leakage, improved g/sub m/, and unchanged gate capacitance result in a high f/sub T/ at LN temperatures, indicating potential for enhanced performance in digital systems.<>
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