通过经典分子动力学模拟模拟SiGe:寻找合适的经验势

L. Martín, I. Santos, P. López, L. Marqués, M. Aboy, L. Pelaz
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引用次数: 2

摘要

我们使用经典的分子动力学模拟来重现Si, Ge和SiGe的基本性质,使用文献中不同的经验势。利用与实验数据相协调的经验势来研究这些材料的表面稳定性。我们考虑了(100)、(100)2\ × 1$和(111)表面,并找到了避免研究表面结构退化的加工温度范围。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Modeling SiGe Through Classical Molecular Dynamics Simulations: Chasing an Appropriate Empirical Potential
We used classical molecular dynamics simulations to reproduce basic properties of Si, Ge and SiGe using different empirical potentials available in the literature. The empirical potential that offered the better compromise with experimental data was used to study the surface stability of these materials. We considered the (100), $(100)2\times 1$ and (111) surfaces, and we found the processing temperature range to avoid the structural degradation of studied surfaces.
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