光子集成电路InP中深蚀刻DBR光栅

2007 IEEE 19th International Conference on Indium Phosphide & Related Materials Pub Date : 2007-05-14 DOI:10.1109/ICIPRM.2007.381164

B. Docter, E. J. Geluk, M. Sander-Jochem, F. Karouta, M. Smit

{"title":"光子集成电路InP中深蚀刻DBR光栅","authors":"B. Docter, E. J. Geluk, M. Sander-Jochem, F. Karouta, M. Smit","doi":"10.1109/ICIPRM.2007.381164","DOIUrl":null,"url":null,"abstract":"A novel fabrication process was developed to realize high quality SiOx masks for CI2 based ICP etching of InP. First order DBR mirrors, 3 mum deep, were realized that can be used in photonic circuits. The process can be used in combination with conventional optical lithography, reducing production cost.","PeriodicalId":352388,"journal":{"name":"2007 IEEE 19th International Conference on Indium Phosphide & Related Materials","volume":"31 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-05-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"25","resultStr":"{\"title\":\"Deep Etched DBR Gratings in InP for Photonic Integrated Circuits\",\"authors\":\"B. Docter, E. J. Geluk, M. Sander-Jochem, F. Karouta, M. Smit\",\"doi\":\"10.1109/ICIPRM.2007.381164\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A novel fabrication process was developed to realize high quality SiOx masks for CI2 based ICP etching of InP. First order DBR mirrors, 3 mum deep, were realized that can be used in photonic circuits. The process can be used in combination with conventional optical lithography, reducing production cost.\",\"PeriodicalId\":352388,\"journal\":{\"name\":\"2007 IEEE 19th International Conference on Indium Phosphide & Related Materials\",\"volume\":\"31 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-05-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"25\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2007 IEEE 19th International Conference on Indium Phosphide & Related Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.2007.381164\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 IEEE 19th International Conference on Indium Phosphide & Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.2007.381164","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 25

摘要

为了实现高质量的SiOx掩模，本文提出了一种新的制备工艺。实现了一阶DBR反射镜，深度为3微米，可用于光子电路。该工艺可与常规光学光刻结合使用，降低生产成本。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Deep Etched DBR Gratings in InP for Photonic Integrated Circuits

A novel fabrication process was developed to realize high quality SiOx masks for CI2 based ICP etching of InP. First order DBR mirrors, 3 mum deep, were realized that can be used in photonic circuits. The process can be used in combination with conventional optical lithography, reducing production cost.

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来源期刊

2007 IEEE 19th International Conference on Indium Phosphide & Related Materials

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