{"title":"电子束光刻系统中可靠的纳米级生长模板生成的电子束剂量优化","authors":"S. Guhathakurata, S. Chattopadhyay, M. Palit","doi":"10.1109/ISDCS.2018.8379635","DOIUrl":null,"url":null,"abstract":"Dose optimization of electron beam has been performed for transferring nano-dimension patterns by employing electron beam lithography. An extensive study has been conducted for optimizing lithographic features with e-beam resist PMMA of different thicknesses. It has been possible to obtain sub-80 nm circular dot patterns with good resolution and high aspect ratio. Au template has been developed by employing lift-off technique for subsequent nanostructure growth employing VLS method. TiO2 nanoislands have been grown on patterned Au template and its crystallographic nature has been studied by using X-ray diffraction measurement. The grown nanoislands showed perfect hexagonal facets.","PeriodicalId":374239,"journal":{"name":"2018 International Symposium on Devices, Circuits and Systems (ISDCS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-03-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Optimization of electron beam dose for reliable nanoscale growth template formation in electron beam lithography system\",\"authors\":\"S. Guhathakurata, S. Chattopadhyay, M. Palit\",\"doi\":\"10.1109/ISDCS.2018.8379635\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Dose optimization of electron beam has been performed for transferring nano-dimension patterns by employing electron beam lithography. An extensive study has been conducted for optimizing lithographic features with e-beam resist PMMA of different thicknesses. It has been possible to obtain sub-80 nm circular dot patterns with good resolution and high aspect ratio. Au template has been developed by employing lift-off technique for subsequent nanostructure growth employing VLS method. TiO2 nanoislands have been grown on patterned Au template and its crystallographic nature has been studied by using X-ray diffraction measurement. The grown nanoislands showed perfect hexagonal facets.\",\"PeriodicalId\":374239,\"journal\":{\"name\":\"2018 International Symposium on Devices, Circuits and Systems (ISDCS)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-03-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 International Symposium on Devices, Circuits and Systems (ISDCS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISDCS.2018.8379635\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 International Symposium on Devices, Circuits and Systems (ISDCS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISDCS.2018.8379635","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Optimization of electron beam dose for reliable nanoscale growth template formation in electron beam lithography system
Dose optimization of electron beam has been performed for transferring nano-dimension patterns by employing electron beam lithography. An extensive study has been conducted for optimizing lithographic features with e-beam resist PMMA of different thicknesses. It has been possible to obtain sub-80 nm circular dot patterns with good resolution and high aspect ratio. Au template has been developed by employing lift-off technique for subsequent nanostructure growth employing VLS method. TiO2 nanoislands have been grown on patterned Au template and its crystallographic nature has been studied by using X-ray diffraction measurement. The grown nanoislands showed perfect hexagonal facets.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
