用于微电子力学的多材料结构的激光化学三维书写

[1991] Proceedings. IEEE Micro Electro Mechanical Systems Pub Date : 1991-01-30 DOI:10.1109/MEMSYS.1991.114796

T. Bloomstein, D. Ehrlich

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引用次数: 15

摘要

研制了一种具有5*10/sup / 4/像素/秒随机存取扫描能力的图像机，作为三维零件激光微化学加工的工具。该工具旨在通过与实体建模CAD/CAM(计算机辅助设计/制造)软件的直接接口实现精密激光沉积和蚀刻反应。三维激光图像机的初步结果表明，在微米深度控制下，锗和硅的清洁蚀刻速度比电火花加工快一到两个数量级。高材料选择性已被用于在氧化膜下书写埋藏的流道。

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Laser-chemical three-dimensonal writing of multimaterial structures for microelectromechanics

A patterning machine capable of 5*10/sup 4/ pixel per second random access scanning has been developed as a tool for laser microchemical fabrication of three-dimensional parts. The tool is designed to implement precision laser deposition and etching reactions through a direct interface to solid modeling CAD/CAM (computer-aided design/manufacturing) software. Initial results with the three-dimensional laser patterning machine demonstrate clean etching of germanium and silicon with micrometer depth control and speeds one to two orders of magnitude faster than electric discharge machining. High material selectivity has been exploited to write buried flow channels under oxide membranes.<>

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[1991] Proceedings. IEEE Micro Electro Mechanical Systems

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