基于FEFET逻辑的低压处理器器件电路设计

Sumitha George, Ahmedullah Aziz, Xueqing Li, M. Kim, S. Datta, J. Sampson, S. Gupta, N. Vijaykrishnan
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引用次数: 43

摘要

铁电场效应管(fefet)是具有低功耗应用潜力的新兴器件。使这些器件适用于超低电压工作的独特特征是铁电氧化物栅极堆栈的负电容实现的陡峭斜率。人们正在积极探索这种特性,以克服与传统mosfet相关的基本60 mV/ 10亚阈值摆幅限制。在本文中,我们重点讨论了fet的陡坡特性对电路的影响。我们分析了fet的特性,以深入了解其性能,并显示出与标准晶体管相比更高的ON电流和更高的栅极电容。我们设计并模拟了环形振荡器和Kogge Stone加法器,并评估了铁电层厚度对其性能的影响。我们的分析表明,与CMOS电路相比,基于ffet的电路在VDD下消耗更低的能量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Device Circuit Co Design of FEFET Based Logic for Low Voltage Processors
Ferroelectric FETs (FEFETs) are emerging devices with potential for low power applications. The unique feature which makes these devices suitable for ultra-low voltage operation is the steep slope achieved by negative capacitance of the ferroelectric oxide based gate stack. This property is being actively explored to overcome the fundamental 60 mV/decade sub threshold swing limit associated with conventional MOSFETs. In this paper, we focus on the circuit implications of the steep slope behavior of the FEFETs. We analyze the characteristics of FEFETs to get insights into their performance, and show both higher ON current and higher gate capacitance compared to standard transistors. We design and simulate a ring oscillator and a Kogge Stone adder using FEFET devices and evaluate the impact of ferroelectric layer thickness on the performance. Our analysis shows that FEFET based circuits consume lower energy compared to CMOS circuits at VDD.
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