C. Rheinfelder, K. Strohm, F. Beisswanger, J. Gerdes, F. Schmuckle, J. Luy, W. Heinrich
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引用次数: 1

摘要

介绍了SiGe hbt共面mmic的初步研究结果。该电路采用双台面HBT工艺在高电阻率Si衬底上制造。在ka波段,振荡器输出功率为1 dBm,单级放大器增益为4.4 dB。这证明了SiGe晶体管在更高微波范围内的应用潜力。
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26 GHz coplanar SiGe MMICs
First results on coplanar MMICs with SiGe HBTs are presented. The circuits are fabricated on high-resistivity Si substrates using a double-mesa HBT process. In the Ka-band, an oscillator output power of 1 dBm and 4.4 dB gain for a one-stage amplifier are achieved. This demonstrates the potential of SiGe transistors for applications in the higher microwave range.
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