石墨烯迁移率和接触的可变性:表面效应、掺杂和应变

E. Carrion, J. Wood, Ashkan Behman, Maryann C. Tung, J. Lyding, E. Pop
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引用次数: 3

摘要

众所周知,基于化学气相沉积(CVD)石墨烯的器件表现出很大的电性能变化[1]。然而,这种可变性的来源以及如何控制它们仍然知之甚少。在这里,我们系统地研究了用三种聚合物支架转移的CVD石墨烯场效应晶体管(gfet)的可变性:PMMA、聚碳酸酯(PC)和PC/PMMA双层(PC与石墨烯接触)。我们发现聚合物/石墨烯在转移过程中的机械相互作用和表面残留物的存在导致石墨烯粗糙度(高达~0.2 nm),掺杂浓度(高达~2.5×1012 cm-2)和聚合物支架之间应变水平(高达~0.2%)的变化。我们发现,PC/PMMA支架中更小的应变和掺杂的组合最终产生最低的接触电阻(Rc)和迁移率(μ)变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Variability of graphene mobility and contacts: Surface effects, doping and strain
It is well known that devices based on chemical vapor deposited (CVD) graphene exhibit substantial variability of their electrical properties [1]. However, the sources of such variability and how they might be controlled remain poorly understood. Here, we methodically investigate variability of CVD graphene field-effect transistors (GFETs) transferred with three polymer scaffolds: PMMA, polycarbonate (PC), and a PC/PMMA bilayer (PC in contact with graphene). We find that the polymer/graphene mechanical interaction during transfer and the presence of surface residues induce changes in graphene roughness (up to ~0.2 nm), doping concentrations (up to ~2.5×1012 cm-2) and strain levels (up to ~0.2%) between the polymer scaffolds used. We uncover that a combination of smaller strain and doping from the PC/PMMA scaffolds ultimately yields the lowest variability of contact resistance (Rc) and mobility (μ).
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