UV-LED绿色制造hfo2基铁电电容器的节能退火工艺

2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM) Pub Date : 2023-03-07 DOI:10.1109/EDTM55494.2023.10103013

Hirotaka Yamada, Satoru Furue, Takehiko Yokomori, Yuki Itoya, T. Saraya, T. Hiramoto, M. Kobayashi

{"title":"UV-LED绿色制造hfo2基铁电电容器的节能退火工艺","authors":"Hirotaka Yamada, Satoru Furue, Takehiko Yokomori, Yuki Itoya, T. Saraya, T. Hiramoto, M. Kobayashi","doi":"10.1109/EDTM55494.2023.10103013","DOIUrl":null,"url":null,"abstract":"Crystallization of ferroelectric $\\text{Hf}_{0.5}\\text{Zr}_{0.5}\\mathrm{O}_{2}$ (HZO) capacitors with TiN electrodes is demonstrated using ultraviolet (UV)-LED annealing process, for the first time. The ferroelectric characteristics obtained by this method are comparable to those achieved by conventional infrared (IR)-RTA process at 400°C ~ 450°C. Since the absorptance of the ferroelectric films is highest in UV region, the UV-LED annealing process is promising to achieve much higher energy-efficient annealing process than the conventional IR-RTA method for green manufacturing.","PeriodicalId":418413,"journal":{"name":"2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)","volume":"25 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Energy-efficient Annealing Process of HfO2-based Ferroelectric Capacitor using UV-LED for Green Manufacturing\",\"authors\":\"Hirotaka Yamada, Satoru Furue, Takehiko Yokomori, Yuki Itoya, T. Saraya, T. Hiramoto, M. Kobayashi\",\"doi\":\"10.1109/EDTM55494.2023.10103013\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Crystallization of ferroelectric $\\\\text{Hf}_{0.5}\\\\text{Zr}_{0.5}\\\\mathrm{O}_{2}$ (HZO) capacitors with TiN electrodes is demonstrated using ultraviolet (UV)-LED annealing process, for the first time. The ferroelectric characteristics obtained by this method are comparable to those achieved by conventional infrared (IR)-RTA process at 400°C ~ 450°C. Since the absorptance of the ferroelectric films is highest in UV region, the UV-LED annealing process is promising to achieve much higher energy-efficient annealing process than the conventional IR-RTA method for green manufacturing.\",\"PeriodicalId\":418413,\"journal\":{\"name\":\"2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)\",\"volume\":\"25 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-03-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EDTM55494.2023.10103013\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EDTM55494.2023.10103013","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

首次用紫外(UV) led退火工艺制备了具有TiN电极的铁电$\text{Hf}_{0.5}\text{Zr}_{0.5}\ maththrm {O}_{2}$ (HZO)电容器。该方法在400℃~ 450℃下获得的铁电特性可与传统红外-RTA法获得的铁电特性相媲美。由于铁电薄膜在紫外区吸收率最高，因此UV- led退火工艺有望实现比传统IR-RTA方法更高的绿色制造节能退火工艺。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Energy-efficient Annealing Process of HfO2-based Ferroelectric Capacitor using UV-LED for Green Manufacturing

Crystallization of ferroelectric $\text{Hf}_{0.5}\text{Zr}_{0.5}\mathrm{O}_{2}$ (HZO) capacitors with TiN electrodes is demonstrated using ultraviolet (UV)-LED annealing process, for the first time. The ferroelectric characteristics obtained by this method are comparable to those achieved by conventional infrared (IR)-RTA process at 400°C ~ 450°C. Since the absorptance of the ferroelectric films is highest in UV region, the UV-LED annealing process is promising to achieve much higher energy-efficient annealing process than the conventional IR-RTA method for green manufacturing.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)

自引率

0.00%

发文量