一种控制表面电位的碱性溶液中x射线掩膜清洗新技术

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) Pub Date : 2000-07-11 DOI:10.1109/IMNC.2000.872619

M. Tuda, M. Kinugawa, H. Ootera, K. Marumoto

{"title":"一种控制表面电位的碱性溶液中x射线掩膜清洗新技术","authors":"M. Tuda, M. Kinugawa, H. Ootera, K. Marumoto","doi":"10.1109/IMNC.2000.872619","DOIUrl":null,"url":null,"abstract":"This paper presents an electrochemical surface cleaning (ECSC) technique for x-ray masks employing amorphous WN/sub x/ absorbers. The electrostatic surface potential of the mask in alkaline solutions is precisely controlled for preventing from corrosion or etching of absorber films during cleaning, thus leading to almost no change in pattern dimension and film stress between before and after cleaning.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"90 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A new cleaning technique for x-ray masks in alkaline solutions by control of surface potential\",\"authors\":\"M. Tuda, M. Kinugawa, H. Ootera, K. Marumoto\",\"doi\":\"10.1109/IMNC.2000.872619\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents an electrochemical surface cleaning (ECSC) technique for x-ray masks employing amorphous WN/sub x/ absorbers. The electrostatic surface potential of the mask in alkaline solutions is precisely controlled for preventing from corrosion or etching of absorber films during cleaning, thus leading to almost no change in pattern dimension and film stress between before and after cleaning.\",\"PeriodicalId\":270640,\"journal\":{\"name\":\"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)\",\"volume\":\"90 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-07-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMNC.2000.872619\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.2000.872619","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

本文提出了一种采用无定形氮化镓/亚氮化镓/吸收剂的x射线掩膜电化学表面清洗技术。精确控制掩膜在碱性溶液中的静电表面电位，防止清洗过程中吸收膜的腐蚀或蚀刻，从而使清洗前后的图案尺寸和膜应力几乎没有变化。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

A new cleaning technique for x-ray masks in alkaline solutions by control of surface potential

This paper presents an electrochemical surface cleaning (ECSC) technique for x-ray masks employing amorphous WN/sub x/ absorbers. The electrostatic surface potential of the mask in alkaline solutions is precisely controlled for preventing from corrosion or etching of absorber films during cleaning, thus leading to almost no change in pattern dimension and film stress between before and after cleaning.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)

自引率

0.00%

发文量