双焊芯片结构热致变形的数值模拟研究

Luiza Dobre, A. Bojita, M. Purcar, A. Fazakas
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引用次数: 0

摘要

由重复功率循环产生的过电压和/或过电流会严重影响功率MOSFET集成电路(IC)的使用寿命。因此,这些装置经常受到缺陷的影响。基于铜夹技术的功率MOSFET集成电路遇到的主要缺陷是焊料疲劳和铝退化[1]。根本原因是本构材料之间的热膨胀系数(CTE)不匹配,导致芯片金属化变形(例如,金属层中的皱纹)。本文采用数值模拟的方法,研究了不同几何尺寸影响下不同温度循环下的机械变形积累。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The investigation by numerical simulation of thermal induced deformation in a double soldered chip structure
The overvoltages and/or overcurrents generated by the repetitive power cycling can highly impact the power MOSFET integrated circuits (IC) lifetime. Hence, these devices are often subjected to defects. The predominant defects meet in power MOSFET IC based on copper clip technology are solder fatigue and aluminum degradation [1]. The root cause is the Coefficient of Thermal Expansion (CTE) mismatch between the constitutive materials, leading to chip metallization deformation (e.g., wrinkles in metal layers). In this paper, the accumulation of mechanical deformation is assessed by numerical simulation during several temperature cycles under the influence of various geometry dimensions.
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