高功率微波器件用等离子喷涂金属多孔阴极

2013 IEEE 14th International Vacuum Electronics Conference (IVEC) Pub Date : 2013-05-21 DOI:10.1109/IVEC.2013.6571036

V. Smirnov, P. I. Akimov, G. Melnichuk, V. Chudin, A. P. Nikitin, I. A. Freydovich, Y. Potapov, Y. Sudakov, A. Bogoslovskaya

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引用次数: 1

摘要

介绍了大功率多束速调管用等离子喷涂金属多孔阴极的工艺和设计要点。给出了在实际设备上运行时阴极组件的样品及其参数。本文给出了在强制温度条件下阴极发射特性的研究结果，以确定最大电流密度和预测发射耐久性。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Plasma spraying metal-porous cathodes for high-power microwave devices

Technological and design parts of plasma spraying metal-porous cathodes manufacturing for high-power multi-beam klystron are presented. The samples of cathode assemblies and their parameters are shown when operating in real devices. The results of investigations of the cathodes emission properties in the forced temperature conditions are presented in order to determine the maximum current density and predict emission durability.

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2013 IEEE 14th International Vacuum Electronics Conference (IVEC)

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