子栅偏压对具有纳米沟道的肖特基势垒SOI mosfet工作的影响

Horng-Chih Lin, Meng-Fan Wang, F. Hou, Jan-Tsai Liu, Yiming Li, Tiao-Yuan Huang, S. Sze
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引用次数: 7

摘要

研究了一种具有硅化肖特基源/漏极和子栅极诱导的场致S/D扩展的新型纳米绝缘子上硅(SOI)器件的特性。新器件具有独特的高性能双通道操作能力。在这项工作中,特别注意了子栅偏压对器件工作的影响。结果表明,施加子栅电压不仅能增加导通电流,而且能有效抑制导通漏电流。因此获得了极高的通/关电流比(>10/sup /)。子门偏置对子阈值摆幅和阈值电压滚降特性的依赖性也进行了探讨。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effects of sub-gate bias on the operation of Schottky-barrier SOI MOSFETs having nano-scale channel
The characteristics of a novel nano-scale silicon-on-insulator (SOI) device featuring silicide Schottky source/drain and field-induced S/D extensions induced by a sub-gate were investigated. The new device exhibits unique and high-performance bi-channel operation capability. In this work, particular attention was paid to the effects of subgate bias on the device operation. It is shown that the applied sub-gate voltage not only increases the on-state current, but also effectively suppresses the off-state leakage. Extremely high on/off current ratio (>10/sup 9/) has thus been obtained. Dependences of sub-gate bias on sub-threshold swing and threshold-voltage roll-off characteristics were also explored.
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