砷化镓纳米线中锌掺杂物浓度的定量测定

T. Burgess, S. Du, B. Gault, Q. Gao, H. Tan, R. Zheng, C. Jagadish
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引用次数: 0

摘要

采用原子探针层析成像技术对砷化镓纳米线中锌掺杂物的浓度和分布进行了定量分析。通过气-固工艺径向沉积的材料与通过气-液-固工艺生长的芯相比,具有明显更高的掺杂浓度。芯材和壳材的锌浓度分别高达7×1019和5×1020原子/cm3。掺杂剂的激活被电特性证实,这表明纳米线的导电性增加了几个数量级。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Quantification of the zinc dopant concentration in GaAs nanowires
The zinc dopant concentration and distribution in GaAs nanowires is quantified by atom probe tomography. Material deposited radially by a vapour-solid process is shown to have a significantly higher dopant concentration in comparison to the core which grows by the vapour-liquid-solid process. Zinc concentrations of up to 7×1019 and 5×1020 atoms/cm3 are measured for core and shell materials respectively. Dopant activation is confirmed by electrical characterization which demonstrates an orders of magnitude increase in nanowire conductivity.
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