针对金刚石上硅材料的硅器件工艺评价

A. Soderbarg, B. Edholm, S. Bengtsson
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引用次数: 2

摘要

金刚石上硅(SOD)是下一代SOI材料的候选材料,特别是在需要高散热能力的应用中。未掺杂的金刚石在低于600 K的温度下是一种高度电绝缘的材料。电阻率高于10/sup 13/ /spl ω /cm(在10v时),击穿场高于10/sup 7/ V/cm。金刚石的导热性比硅好10倍,比二氧化硅好1000倍以上。本文讨论并评价了在sod材料上成功制造器件所必需的工艺修改。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Evaluation of silicon device processes aimed for silicon-on-diamond material
Silicon-on-Diamond (SOD) is a candidate for the next generation of SOI materials, especially for applications requiring high heat spreading capability. Undoped diamond is a highly electrically insulating material at temperatures below 600 K. Resistivities above 10/sup 13/ /spl Omega/cm (at 10 V) and breakdown fields above 10/sup 7/ V/cm have been reported. Diamond conducts heat about 10 times better than silicon and more than 1000 times better than silicon dioxide. In this paper, necessary process modifications for successful manufacturing of devices on SOD-materials are discussed and evaluated.
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